Methods for making patterned, thick, silicon-containing electrodes
US10622621B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 31, 2017 |
| Grant date | Apr 14, 2020 |
| Priority date | — |
| Expiry date | Apr 7, 2038 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02T10/70
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A high performance electrode for an electrochemical cell including electroactive materials having a large charge capacity and that undergo substantial volumetric expansion and contraction during cycling of the electrochemical cell and a method for making the high performance electrode are provided. The electroactive material of the high performance electrode may have a thickness greater than or equal to about 1 μm. Methods of forming the high performance electrodes includes patterning the electroactive material to form a plurality of void spaces using a high-speed process selected from the group consisting of: laser ablation, electron beam machining, ion beam milling, roll forming, embossing, lithography, and combinations thereof. The plurality of void spaces accommodates the volumetric expansion and contraction to minimize cracking and damage to the electrode during cycling of the electrochemical cell.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.