Method of producing a relief image from a liquid photopolymer resin
US10625334B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 11, 2017 |
| Grant date | Apr 21, 2020 |
| Priority date | — |
| Expiry date | Mar 12, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/26
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A method of producing a relief image or mold from a liquid photopolymer resin, said method comprising the steps of: a) placing an image film onto an exposure glass; b) placing a cover film over the image film and drawing a vacuum c) placing substrate material on a bottom glass d) casting a liquid photopolymer resin layer onto the substrate material; d) laminating a flexible polyester sheet onto a backside of the liquid photopolymer resin layer as the liquid photopolymer resin layer is being cast onto the substrate material; and e) exposing the liquid photopolymer resin layer through the image film to selectively crosslink and cure the photopolymerizable resin layer and form a cured relief image, wherein said depth of the cured relief image is less than the height of the cast liquid photopolymerizable resin.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.