Anti-reflective film and manufacturing method thereof
US10627548B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 3, 2016 |
| Grant date | Apr 21, 2020 |
| Priority date | — |
| Expiry date | Nov 3, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08K7/26
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
Described herein is an anti-reflective film including: a hard coating layer; and a low-refractive layer containing a binder resin and hollow inorganic nanoparticles and solid inorganic nanoparticles dispersed in the binder resin. The hollow and solid inorganic particles are dispersed in the low-refractive layer such that the amount of the solid inorganic nanoparticles positioned close to an interface between the hard coating layer and the low-refractive layer is larger than that of the hollow inorganic nanoparticles. Also described is a manufacturing method of the anti-reflective film including: applying a resin composition containing a photopolymerizable compound or a (co)polymer thereof, a fluorine-containing compound including a photoreactive functional group, a photoinitiator, hollow inorganic nanoparticles, and solid inorganic nanoparticles on a hard coating layer, and drying the applied resin composition at a temperature of 35° C. to 100° C.; and photocuring the dried resin composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.