Patent · US Active

Polishing pad and material and manufacturing method for such

US10632591B2 · kind B2 · utility

0Cited by

6References

20Claims

0Family size

Assignee

KWH MIRKA LTD · FI

Inventors

Hans Hede · Gorkha, NP
Goran Hoglund · Vexala, FI

Key dates

Filing date	Jan 28, 2015
Grant date	Apr 28, 2020
Priority date	—
Expiry date	Jun 11, 2035

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB24D13/14
WIPO fieldMachine tools
WIPO sectorMechanical engineering

Abstract

A polishing pad for polishing a surface, material for a polishing pad and a method for manufacturing material for a polishing pad. A polishing pad has a backing layer and a polishing layer made of sheep wool fibres fixed onto a surface of the backing layer, wherein the polishing layer has loops made of sheep wool fibres.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.