Patterned bank structures on substrates and formation method
US10635001B2 · kind B2 · utility
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33Claims
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Key dates
| Filing date | Jul 25, 2016 |
| Grant date | Apr 28, 2020 |
| Priority date | — |
| Expiry date | Aug 8, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K50/11
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photolithiographic method for fabricating bank structures with improved non-wetting properties to form well regions on a substrate using a photoresist composition comprising a cresol novolak resin, a photoactive diazonaphthoquinone sulfonic ester of a polyhydroxybenzophenone compound with at least one free hydroxyl group, and a non-ionic urethane polyglycol fluorosurfactant. Inkjet methods can be used to deposit active materials into the well areas. Color filter arrays and optoelectronic devices such as OLED devices can be made by this method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.