Process for manufacturing an implant for focal electrical stimulation of a nervous structure

US10639472B2 · kind B2 · utility

Assignees

• Chambre de Commerce et D'Industrie de Region Paris Ile de France (ESIEE Paris) · FR
• Universite Pierre Et Marie Curie (Paris 6) · FR
• CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE · FR
• Institut National de la Sante et de la Recherche Medicale (INSERM) · FR

Inventors

• Lionel Rousseau · Le Perreux-sur-Marne, FR
• Gaelle Lissorgues · Le Perreux-sur-Marne, FR
• Myline Cottance · Orly, FR
• Serge Picaud · Avon, FR
• Julie Degardin · Ris-Orangis, FR

Key dates

• Filing date: Nov 19, 2015
• Grant date: May 5, 2020
• Expiry date: Nov 4, 2036

Classification

• Technology area (CPC H): Electricity
• CPC primary: H05K2201/0154
• WIPO field: Medical technology
• WIPO sector: Instruments

Abstract

The invention relates to a process for manufacturing at least one implant for focal electrical stimulation of a nervous structure, said implant being of the type including in a supporting structure a network of cavities at the bottom of which are placed microelectrodes, the cavities being bounded by walls erected and located around the microelectrodes, the supporting structure being produced beforehand by implementing the following steps: deposition and etching, in a planar manner, on an insulating substrate, of electrical contacts, of electrical tracks and of microelectrodes, first tracks electrically connecting the microelectrodes and the electrical contacts, second electrical tracks being electrically connected to a ground.