Flexible polishing apparatus for granulated grains
US10639638B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 26, 2015 |
| Grant date | May 5, 2020 |
| Priority date | — |
| Expiry date | Aug 27, 2036 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA23V2002/00
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A flexible polishing apparatus for granulated grains is provided. The flexible polishing apparatus includes a housing, a feeding device, at least one flexible polishing unit, a bran discharging device, and a rice outlet. The flexible polishing unit includes a radial gravity self-flow flexible polishing chamber. The feeding device, the flexible polishing chamber and the rice outlet are sequentially arranged from top to bottom along the gravity direction. The flexible polishing apparatus for granulated grains avoids the shear effect of granulated grains in the polishing chamber, improves the flexible friction effect, and greatly reduces the damage to rice in the polishing process while ensuring that rice bran is cleaned and the rice is polished, thereby improving the rate of polished rice and reducing energy consumption.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.