Patent · US Active

Apparatuses and methods for measuring a clearance

US10641605B2 · kind B2 · utility

0Cited by
1References
17Claims
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Key dates

Filing dateAug 17, 2017
Grant dateMay 5, 2020
Priority date
Expiry dateJul 13, 2038

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01B17/02
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

The present disclosure provides an apparatus and method for measuring a clearance. The apparatus comprises: a first measurement component configured to be mounted on a first object in a mounted state thereof, so that a first measurement surface of the first measurement component is aligned with a first surface to be measured of the first object; and a second measurement component configured to be mounted on a second object in a mounted state thereof, so that a second measurement surface of the second measurement component is aligned with a second surface to be measured of the second object, wherein the first measurement component comprises a measurement instrument configured to measure a first distance between the measurement instrument and the first measurement surface and a second distance between the measurement instrument and the second measurement surface, wherein the clearance is calculated based on the first distance and the second distance.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.