Optical element

US10642167B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Vitaliy Shklover · Heidenheim, DE
• Michael Schall · Oberkochen, DE
• Johannes Kraus · Gerbrunn, DE
• Oliver Gloeckl · Aalen, DE
• Jeffrey Erxmeyer · Oberkochen, DE
• Horst Feldermann · Aalen, DE
• Konstantin Forcht · Aalen, DE
• Ute Heinemeyer · Neustadt an der Weinstraße, DE

Key dates

• Filing date: Mar 6, 2018
• Grant date: May 5, 2020
• Expiry date: Jul 2, 2038

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70316
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

In order to make possible both good laser resistance and good antireflection properties, an optical element, in particular for UV lithography, comprising a substrate and a coating on the substrate having at least four layers, is proposed, wherein