Method and system for charged particle microscopy with improved image beam stabilization and interrogation

US10643819B2 · kind B2 · utility

Assignee

• KLA-TENCOR CORPORATION · US

Inventors

• Doug K. Masnaghetti · San Jose, US
• Gabor Toth · San Jose, US
• David Trease · Alameda, US
• Rohit Bothra · Milpitas, US
• Grace Hsiu-Ling Chen · San Jose, US
• Rainer Knippelmeyer · Utting am Ammersee, DE

Key dates

• Filing date: Mar 24, 2016
• Grant date: May 5, 2020
• Expiry date: May 20, 2038

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/2806
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.