Metallic layer comprising alkali metal and second metal

US10651387B2 · kind B2 · utility

Assignee

• Novaled GmbH · DE

Inventors

• Tomas Kalisz · Dresden, DE
• Francois Cardinali · Dresden, DE
• Jerome Ganier · Dresden, DE
• Uwe Gölfert · Rabenau, DE
• Vygintas Jankus · Dresden, DE
• Carsten Rothe · Dresden, DE
• Benjamin Schulze · Dresden, DE
• Steffen Willmann · Dresden, DE

Key dates

• Filing date: Nov 9, 2016
• Grant date: May 12, 2020
• Expiry date: Nov 9, 2036

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y02E10/549
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

The present invention relates to a metallic layer adjacent to a semiconducting layer comprising a substantially covalent matrix material, the metallic layer comprising at least one first metal and at least one second metal, wherein a) the first metal is selected from the group consisting of Li, Na, K, Rb, Cs; and b) the second metal is selected from the group consisting of Zn, Hg, Cd, Te, electronic devices comprising such materials and process for preparing the same.