Grinding disk and method of manufacturing the same
US10654150B2 · kind B2 · utility
0Cited by
7References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 26, 2017 |
| Grant date | May 19, 2020 |
| Priority date | — |
| Expiry date | Feb 27, 2038 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/56
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A grinding disk and a method of manufacturing the same are provided. The grinding disk includes a graphite base and a silicon carbide film, the silicon carbide film covering the graphite base, and the silicon carbide film has a surface grain size of 5 μm to 80 μm. By a hot-wall chemical vapor deposition system, a highly dense silicon carbide film is formed on a surface of the graphite base. The grinding disk may replace a conventional metallographic grinding and polishing disk, and is improved in characteristics such as hydrophobicity and abrasion resistance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.