Mask, method for manufacturing the same, and mask assembly
US10662519B2 · kind B2 · utility
0Cited by
5References
16Claims
0Family size
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Key dates
| Filing date | Jun 13, 2017 |
| Grant date | May 26, 2020 |
| Priority date | — |
| Expiry date | Jun 16, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/166
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A mask, a method for manufacturing a mask, and a mask assembly are disclosed. The mask includes an effective region for evaporation and an edge region between an edge of the effective region for evaporation extending in a stretching direction and an edge of the mask extending in the stretching direction. The edge region is provided with a bending relieving structure for relieving a curling of the edge of the effective region for evaporation when the mask is stretched in the stretching direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.