Patent · US Active

Mask and fabrication method thereof

US10663857B2 · kind B2 · utility

11Cited by
0References
15Claims
0Family size

Assignees

Inventors

Key dates

Filing dateFeb 22, 2017
Grant dateMay 26, 2020
Priority date
Expiry dateFeb 22, 2037

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10K71/166
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A mask and a fabrication method thereof are provided. The mask includes: a frame, which includes a hollow portion and a border surrounding the hollow portion; an opening plate, which is provided on the frame and includes an opening and a body surrounding the opening, the opening corresponding to the hollow portion, and the body being connected with the border; and a pattern plate, which is provided on the opening plate and includes a pattern portion and a non-pattern portion positioned in a periphery of the pattern portion, the pattern portion corresponding to the opening, the non-pattern portion being connected with the body of the opening plate, and the non-pattern portion and the frame being separated from each other at a position of the border.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.