Imprint system and imprinting process with spatially non-uniform illumination
US10663869B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 11, 2017 |
| Grant date | May 26, 2020 |
| Priority date | — |
| Expiry date | Dec 11, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70558
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An imprinting system and method. An illumination system for imprinting, during a first period of time, that illuminates a first portion of boundary region that surrounds a pattern region with a thickening dosage of light that is within a first dose range, such that the fluid in the first portion of the boundary region does not solidify but does increase a viscosity of the fluid. The illumination system, during a second period of time, illuminates the pattern region with a curing dosage of light that is within a second dose range higher than the first dose range. Prior to illumination, the imprinting includes dispensing droplets and holding a template with a template chuck such that the template contact the droplets and the droplets merge and form a fluid front that spreads through the pattern region and towards the boundary region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.