Heterogeneous wet synthesis process for preparation of high purity tungsten pentahalide

US10669160B2 · kind B2 · utility

Assignees

• L'Air Liquide, Societe Anonyme Pour l'Etude et l'Exploitation des Procedes Georges Claude · FR
• American Air Liquide, Inc. · US

Inventors

• Yumin Liu · Fussa, JP
• Feng Li · San Jose, US
• Zhiwen Wan · Plano, US
• Claudia Fafard · Marienthal, DE
• Stefan Wiese · Braunschweig, DE
• Guillaume Husson · Newark, US
• Grigory Nikiforov · Bound Brook, US
• Bin SUI · Houston, US
• Jean-Marc Girard · Versailles, FR

Key dates

• Filing date: Apr 30, 2018
• Grant date: Jun 2, 2020
• Expiry date: Aug 4, 2038

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C01P2006/80
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

Synthesis of tungsten pentahalide compositions having low impurity profiles are disclosed. The specific impurity profile permits deposition of high purity tungsten-containing films using vapor deposition processes or other semiconductor manufacturing processes without introduction of performance-impacting contaminants.