Multi-layer deposition system and process
US10669627B2 · kind B2 · utility
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2References
12Claims
0Family size
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Key dates
| Filing date | Aug 30, 2017 |
| Grant date | Jun 2, 2020 |
| Priority date | — |
| Expiry date | Aug 30, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/022
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A modular multilayer deposition system includes a plurality of modular deposition chambers, including at least one parylene deposition chamber and at least one ALD deposition chamber. The parylene deposition chamber is connected in series with the ALD deposition chamber. Substrates are automatically moved from within the parylene deposition chamber to within the ALD deposition chamber or from within the ALD deposition chamber to the parylene deposition chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.