Patent · US Active

Multi-layer deposition system and process

US10669627B2 · kind B2 · utility

0Cited by
2References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 30, 2017
Grant dateJun 2, 2020
Priority date
Expiry dateAug 30, 2037

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/022
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A modular multilayer deposition system includes a plurality of modular deposition chambers, including at least one parylene deposition chamber and at least one ALD deposition chamber. The parylene deposition chamber is connected in series with the ALD deposition chamber. Substrates are automatically moved from within the parylene deposition chamber to within the ALD deposition chamber or from within the ALD deposition chamber to the parylene deposition chamber.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.