Patent · US Active

Plasma processing system with consumable identification

US10674593B2 · kind B2 · utility

0Cited by
2References
21Claims
0Family size

Assignee

Inventor

Key dates

Filing dateSep 15, 2017
Grant dateJun 2, 2020
Priority date
Expiry dateJun 30, 2038

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05H1/3494
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A plasma processing system includes a torch having a consumable. A gas pressure regulator includes an input pressure sensor configured to sense an input pressure to the gas pressure regulator. A gas conduit supplies gas from the gas pressure regulator to the torch. A controller is operatively connected to the gas pressure regulator to receive an input pressure signal from the input pressure sensor and to provide a control signal to the gas pressure regulator to control operations of the gas pressure regulator and set an output pressure of the gas pressure regulator. The controller is configured to identify the consumable based on both of the input pressure to the gas pressure regulator and the control signal provided to the gas pressure regulator.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.