Patent · US Active

Method of reducing ODF mura in polymer stabilised liquid crystal displays

US10676671B2 · kind B2 · utility

0Cited by

1References

25Claims

0Family size

Assignee

Merck Patent GmbH · DE

Inventors

Leo Weegels · Darmstadt, DE
Roger Chang · New Taipei, TW
Ky Lin · Taipei, TW

Key dates

Filing date	Jun 23, 2016
Grant date	Jun 9, 2020
Priority date	—
Expiry date	Aug 23, 2036

Classification

Technology area (CPC G)Physics
CPC primaryG02F1/13415
WIPO fieldBasic materials chemistry
WIPO sectorChemistry

Abstract

The present invention relates to a method of reducing ODF mura in liquid crystal (LC) displays of the polymer sustained alignment (PSA) type and to PSA LC displays made by this method.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.