Methods and systems for generating patterns on flexible substrates
US10676809B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 20, 2018 |
| Grant date | Jun 9, 2020 |
| Priority date | — |
| Expiry date | Jul 27, 2038 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41M7/0054
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
According to certain embodiments, a method of producing a pattern on a substrate comprises securing a flexible polymeric substrate, printing a layer of ink as a negative pattern on the substrate, and placing the flexible polymeric substrate in a vacuum chamber. The method further includes uniformly applying, while the flexible polymeric is under a vacuum in the vacuum chamber, a layer of material over both the layer of ink and the substrate via physical vapor deposition and then removing the flexible polymeric substrate from the vacuum chamber. The method further includes removing the ink and material applied over the ink by immersing the flexible polymeric substrate in a solvent such that it results in a desired pattern of the material on the flexible polymeric substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.