Patent · US Active

Method for manufacturing color filter substrate

US10678124B2 · kind B2 · utility

1Cited by

1References

7Claims

0Family size

Assignees

Inventors

Xiongzhou WEI · Beijing, CN
Min Li · Taichung, TW
Qiang Xiong · Xujing, CN
Jiaqi PANG · Beijing, CN
Chao Liu · Beijing, CN
Bin Wan · Beijing, CN
Hongyu Sun · Issaquah, US
Ruilin Bi · Beijing, CN

Key dates

Filing date	Mar 13, 2018
Grant date	Jun 9, 2020
Priority date	—
Expiry date	Oct 31, 2038

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/105
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Provided is a method for manufacturing a color filter substrate including a base substrate, a black matrix layer and a plurality of color pixel units, and the color pixel unit including sub-pixel units of at least three colors. The method for manufacturing a color filter substrate includes: providing a base substrate; and forming a black matrix layer and the plurality of color pixel units on the base substrate, wherein the forming of the plurality of color pixel units includes: depositing an irreversible temperature-change material on the base substrate; and heating the irreversible temperature-change material to form sub-pixel units of at least two colors in the color pixel unit.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.