Electric field assisted placement of nanomaterials through dielectric engineering

US10679849B2 · kind B2 · utility

Assignee

• International Business Machines Corporation · US

Inventors

• Michael Engel · Karlsruhe, DE
• Mathias B. Steiner · Rio de Janeiro, BR
• Jaione Tirapu Azpiroz · Rio de Janeiro, BR

Key dates

• Filing date: Aug 13, 2019
• Grant date: Jun 9, 2020
• Expiry date: Aug 13, 2039

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S977/742
• WIPO field: Micro-structural and nano-technology
• WIPO sector: Chemistry

Abstract

A method of positioning nanomaterials includes patterning guiding dielectric features from a single layer of guiding dielectric material, and producing an electric field by at least one electrode disposed on a substrate that is attenuated through the guiding dielectric features to create an attractive dielectrophoretic force that guides at least one nanostructure abutting the guiding dielectric features to be positioned on a deposition surface of the substrate.