Patent · US Active

Method for making polymer single nanowires and sensors utilizing the same

US10684250B2 · kind B2 · utility

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Key dates

Filing dateApr 25, 2016
Grant dateJun 16, 2020
Priority date
Expiry dateDec 9, 2037

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S977/762
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method of fabricating polymer single nanowires, comprising the steps of: spin coating a polymethylmethacrylate resist onto a silicon wafer patterned with at least one gold electrode pair; creating a nanochannel using e-beam lithography between each pair of the at least one gold electrode pairs; placing the silicon wafer into an aniline monomer polymerization solution; reacting the polymerization solution to give a coated wafer and a polyaniline film; and cleaning the coated wafer of polymethylmethacrylate resist and polyaniline film to give at least one gold electrode pair with a connecting polymer single nanowire.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.