Method for making polymer single nanowires and sensors utilizing the same
US10684250B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 25, 2016 |
| Grant date | Jun 16, 2020 |
| Priority date | — |
| Expiry date | Dec 9, 2037 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/762
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of fabricating polymer single nanowires, comprising the steps of: spin coating a polymethylmethacrylate resist onto a silicon wafer patterned with at least one gold electrode pair; creating a nanochannel using e-beam lithography between each pair of the at least one gold electrode pairs; placing the silicon wafer into an aniline monomer polymerization solution; reacting the polymerization solution to give a coated wafer and a polyaniline film; and cleaning the coated wafer of polymethylmethacrylate resist and polyaniline film to give at least one gold electrode pair with a connecting polymer single nanowire.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.