Method and system for performing cross-validation for model-based layout recommendations
US10699051B1 · kind B1 · utility
23Cited by
8References
20Claims
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Key dates
| Filing date | Jun 29, 2018 |
| Grant date | Jun 30, 2020 |
| Priority date | — |
| Expiry date | Aug 21, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2111/20
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Disclosed are method(s), system(s), and article(s) of manufacture for implementing layouts for an electronic design using machine learning, where users re-use patterns of layouts that have been previously implemented, and those previous patterns are applied to create recommendations in new situations. An improved approach to perform cross-validations is provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.