Method and apparatus for image adjustment for panoramic image stitching
US10699375B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 14, 2017 |
| Grant date | Jun 30, 2020 |
| Priority date | — |
| Expiry date | Jul 28, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04N23/698
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method, apparatus and computer program products are provided for reducing artifacts in a seam region when stitching overlapping images. One example method includes extracting the seam region from the overlapping images, wherein the overlapping images comprise a first image captured by a first image capturing device and a second image captured by a second image capturing device, the overlapping images sharing the seam region, the seam region being a region of each of the first image and the second images depicting a common captured area, applying a set of convergence values to the seam region generating a plurality of strips corresponding to the seam region, dividing the plurality of strips into multiple vertical segments, and computing an optimal convergence for each of the multiple vertical segments.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.