Patent · US Active

Substrate processing system

US10699936B2 · kind B2 · utility

0Cited by
2References
21Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 30, 2016
Grant dateJun 30, 2020
Priority date
Expiry dateMar 6, 2037

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/68771
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A substrate processing system includes a substrate loading unit which loads a plurality of substrates, a substrate transfer unit which transfers N (where N is natural number) substrates at the same time from the substrate loading unit, and a substrate processing unit including a plurality of process chambers which receives the N substrates at the same time from the substrate transfer unit and processes the received substrates where each of the process chambers includes a stage on which the N substrates are disposed and an insulation layer disposed between the N substrates.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.