Compositions and methods for the deposition of silicon oxide films
US10703915B2 · kind B2 · utility
1Cited by
2References
26Claims
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Key dates
| Filing date | Sep 8, 2017 |
| Grant date | Jul 7, 2020 |
| Priority date | — |
| Expiry date | Sep 8, 2037 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01P2006/10
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Described herein are compositions and methods for forming silicon oxide films. In one aspect, the film is deposited from at least one silicon precursor compound, wherein the at least one silicon precursor compound is selected from the following Formulae A and B: as defined herein.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.