Apparatus and method for printing multilayer organic thin films from vapor phase in an ultra-pure gas ambient
US10704144B2 · kind B2 · utility
7Cited by
33References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 11, 2016 |
| Grant date | Jul 7, 2020 |
| Priority date | — |
| Expiry date | Oct 11, 2036 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/549
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Systems and techniques for depositing organic material on a substrate are provided, in which one or more shield gas flows prevents contamination of the substrate by the chamber ambient. Thus, multiple layers of the same or different materials may be deposited in a single deposition chamber, without the need for movement between different deposition chambers, and with reduced chance of cross-contamination between layers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.