Method for detecting surface impurities by X-ray fluorescence analysis
US10705034B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 28, 2016 |
| Grant date | Jul 7, 2020 |
| Priority date | — |
| Expiry date | Jun 16, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2223/652
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for detecting surface impurities on a surface of a component by X-ray fluorescence analysis uses a hand spectroscope for application to the surface of a component. The hand spectroscope comprises an X-ray source, a fluorescent radiation detector, an analyzer and a display. The method comprises irradiating the surface of the component with X-rays using the X-ray source; detecting fluorescent radiation, which is emitted by the surface of the component as a result of the irradiation with the X-rays, using the fluorescent radiation detector; measuring a radiation spectrum of the detected fluorescent radiation; generating an evaluation result by analyzing the measured radiation spectrum using the analyzer, the evaluation result comprising a quantitative measure of the surface impurity of the surface due to predetermined characteristic substances; and outputting the generated evaluation result on the display.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.