Patent · US Active

Method for detecting surface impurities by X-ray fluorescence analysis

US10705034B2 · kind B2 · utility

0Cited by
10References
13Claims
0Family size

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Key dates

Filing dateOct 28, 2016
Grant dateJul 7, 2020
Priority date
Expiry dateJun 16, 2038

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N2223/652
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method for detecting surface impurities on a surface of a component by X-ray fluorescence analysis uses a hand spectroscope for application to the surface of a component. The hand spectroscope comprises an X-ray source, a fluorescent radiation detector, an analyzer and a display. The method comprises irradiating the surface of the component with X-rays using the X-ray source; detecting fluorescent radiation, which is emitted by the surface of the component as a result of the irradiation with the X-rays, using the fluorescent radiation detector; measuring a radiation spectrum of the detected fluorescent radiation; generating an evaluation result by analyzing the measured radiation spectrum using the analyzer, the evaluation result comprising a quantitative measure of the surface impurity of the surface due to predetermined characteristic substances; and outputting the generated evaluation result on the display.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.