Patent · US Active

Methods and apparatus for cutting a substrate

US10710922B2 · kind B2 · utility

1Cited by
3References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 15, 2016
Grant dateJul 14, 2020
Priority date
Expiry dateAug 22, 2036

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB23K2103/54
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

Methods and apparatus for cutting a substrate are disclosed. In one arrangement, a plurality of recesses are formed in the surface of the substrate. The recesses as such that a stress can be applied to the substrate that is concentrated by the recesses. The concentrated stress causes the substrate to be cut along a cutting line that passes through the recesses. The cutting occurs via propagation of a crack through the recesses.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.