Patent · US Active

Multiblock copolymer films, methods of making same, and uses thereof

US10711111B2 · kind B2 · utility

9Cited by

3References

15Claims

0Family size

Assignees

Cornell University · IT
Yale University · US

Inventors

Ulrich Wiesner · Ithaca, US
Rachel M. Dorin · Rochester, US
Joerg Werner · Ithaca, US
William A. Phillip · New Haven, US

Key dates

Filing date	Oct 5, 2016
Grant date	Jul 14, 2020
Priority date	—
Expiry date	Oct 5, 2036

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC08J2353/00
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

A method for forming an isoporous graded film comprising multiblock copolymers and isoporous graded films. The films have a surface layer and a bulk layer. The surface layer can have at least 1×1014 pores/m2 and a pore size distribution (dmax/dmin)) of less than 3. The bulk layer has an asymmetric structure. The films can be used in filtration applications.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.