Anti-scattering film and method for manufacturing same
US10711144B2 · kind B2 · utility
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18Claims
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Key dates
| Filing date | Aug 17, 2015 |
| Grant date | Jul 14, 2020 |
| Priority date | — |
| Expiry date | Nov 25, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09J2433/006
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention relates to an anti-scattering film and a method for manufacturing the same, the anti-scattering film including: a transparent film; and a hard coating layer formed on top of the transparent film, in which the hard coating layer is formed of a composition which includes a UV-curable acrylate resin, first inorganic nanoparticles, second inorganic nanoparticles, a photoinitiator, and a mixed solvent comprising a ketone-based solvent and an alcohol-based solvent, and a plurality of protruding parts is formed on an upper surface of the hard coating layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.