Impedance matching network and method
US10714314B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 28, 2020 |
| Grant date | Jul 14, 2020 |
| Priority date | — |
| Expiry date | Feb 28, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/334
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
In one embodiment, the present disclosure is directed to a method for impedance matching including a) positioning a matching network between a radio frequency (RF) source and a plasma chamber; b) determining, from among the plurality of match configurations, a new match configuration to be used when there is an expected pulse level change from a first of the pulse levels to a second of the pulse levels; and c) sending a control signal to alter the at least one EVC to provide the new match configuration. The control signal is sent a predetermined time period before a time for the expected pulse level change, the predetermined time period being substantially similar to a time period for the EVC to switch between two match configurations of the plurality of match configurations.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.