Patent · US Active

Array substrate and manufacturing method thereof, liquid crystal display device and manufacturing method thereof

US10714513B2 · kind B2 · utility

0Cited by
3References
20Claims
0Family size

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Key dates

Filing dateApr 12, 2018
Grant dateJul 14, 2020
Priority date
Expiry dateSep 27, 2038

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02F2201/123
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

An array substrate and a manufacturing method thereof are disclosed. The manufacturing method includes forming, on a substrate, a first metal pattern layer, a first insulating layer, a second metal pattern layer, and a second insulating layer, successively; coating a photoresist on the second insulating layer; forming a photoresist pattern and an etching protection layer, in a first region of the array substrate, the photoresist pattern exposing a part of the top surface of the second insulating layer, and being coupled to the second insulating layer through the etching protection layer; and performing etching in the first region by using the photoresist pattern as a mask to remove the etching protection layer and at least part of the second insulating layer, without etching the first insulating layer, so as to expose a part of the second metal pattern layer and form a liquid crystal diversion groove.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.