Patent · US Active

SiO2 containing dispersion with high salt stability

US10723628B2 · kind B2 · utility

1Cited by

7References

11Claims

0Family size

Assignee

Evonik Operations GmbH · DE

Inventors

Wolfgang Lortz · Wächtersbach, DE
Ulrich Fischer · Essen, DE
Christian Panz · Wesseling, DE
Gabriele Bergmann · Großkrotzenburg, DE

Key dates

Filing date	Jun 28, 2016
Grant date	Jul 28, 2020
Priority date	—
Expiry date	Dec 14, 2036

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC01P2006/22
WIPO fieldMaterials, metallurgy
WIPO sectorChemistry

Abstract

Dispersion comprising particles of a surface-modified, hydrophilic silica,

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.