Method of manufacturing a substrate of a display device and mask thereof
US10725371B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 12, 2017 |
| Grant date | Jul 28, 2020 |
| Priority date | — |
| Expiry date | Aug 15, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/20
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of manufacturing a substrate of a display device is provided. The method includes: providing a substrate body; coating a photoresist layer on the substrate body; exposing the photoresist layer by using a plurality lenses of an exposure machine through a mask, wherein the mask includes a light incident region and a light overlap region, the light overlap region includes a transparent zone and a non-transparent zone, and the light incident region includes a transparent zone and a non-transparent zone, and wherein an area of each transparent zone of the light overlap region is larger or smaller than an area of each transparent zone of the light incident region; and developing the photoresist layer after exposing to obtain a photoresist pattern. The embodiment of the disclosure also provides a mask applied to the method. By practice of the disclosure, the exposure pattern of the light overlap region could be compensated in order to obtain more accurate exposure pattern, so the product yield could be improved.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.