Self-similarity analysis for defect detection on patterned industrial objects
US10726540B2 · kind B2 · utility
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Key dates
| Filing date | Oct 17, 2017 |
| Grant date | Jul 28, 2020 |
| Priority date | — |
| Expiry date | Jul 14, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30164
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for object defect detection includes receiving digital data representing an image of an object with a repeated pattern. The method identifies a part of the image of the object as defined by a sample window of the digital data. The method generates one or more functions from at least the part of the image, wherein each of the one or more functions corresponds to one component of a pixel contained in the part of the image. Responsive to performing self-similarity analytics on the one or more functions, the method identifies a defect area of the object.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.