Contamination-repellent mirror and method for producing the same
US10726965B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Apr 26, 2019 |
| Grant date | Jul 28, 2020 |
| Priority date | — |
| Expiry date | Apr 26, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B27/0006
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A contamination-repellent mirror and a method for producing the same. In an embodiment a contamination-repellent mirror includes a mirror layer disposed on a substrate, wherein the mirror layer has a reflection maximum in a wavelength range between 1 nm and 50 nm, a nanorough layer arranged on the mirror layer, wherein the nanorough layer has an rms roughness between 1 nm and 50 nm, and wherein a hygrophobic cover layer is arranged on the nanorough layer or the nanorough layer comprises a hygrophobic material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.