Patent · US Active

Contamination-repellent mirror and method for producing the same

US10726965B2 · kind B2 · utility

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2References
17Claims
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Key dates

Filing dateApr 26, 2019
Grant dateJul 28, 2020
Priority date
Expiry dateApr 26, 2039

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02B27/0006
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A contamination-repellent mirror and a method for producing the same. In an embodiment a contamination-repellent mirror includes a mirror layer disposed on a substrate, wherein the mirror layer has a reflection maximum in a wavelength range between 1 nm and 50 nm, a nanorough layer arranged on the mirror layer, wherein the nanorough layer has an rms roughness between 1 nm and 50 nm, and wherein a hygrophobic cover layer is arranged on the nanorough layer or the nanorough layer comprises a hygrophobic material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.