Patent · US Active

System and method for vacuum film lamination

US10730276B2 · kind B2 · utility

0Cited by
3References
8Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 5, 2018
Grant dateAug 4, 2020
Priority date
Expiry dateSep 2, 2038

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10H20/856
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A vacuum system for film lamination, including a vacuum chamber module, a film-pressing module, a substrate susceptor module and a hot-plate heating module, is disclosed, wherein the film-pressing module includes a film-pressing platen, and the substrate susceptor module includes a substrate susceptor supported by a spring-loaded mechanism. During a film-lamination process, the film-pressing platen is actuated to move downwards to attach a laminating film onto a substrate, and the substrate susceptor is actuated to move downwards and finally rest on the hot-plate heating module. Therefore an adhesive glue disposed between the laminating film and the substrate can be thermally cured. After completing the film-lamination process, the film-pressing platen is actuated upwards so that the substrate susceptor also is actuated to move upwards to its initial position by a restoring force exerted by the spring-loaded mechanism. In such manner, the laminating film can be properly bonded to the substrate to avoid lamination defects such as air bubbles and to improve adhesion strength.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.