In situ creation of planar natural feature targets
US10733798B2 · kind B2 · utility
6Cited by
1References
40Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 14, 2013 |
| Grant date | Aug 4, 2020 |
| Priority date | — |
| Expiry date | Jan 13, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30244
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Disclosed are a system, apparatus, and method for in-situ creation of planar natural feature targets. In one embodiment, a planar target is initialized from a single first reference image one or more subsequent images are processed. In one embodiment, the planar target is tracked in six degrees of freedom upon the processing of the one or more subsequent images and a second reference image is selected from the processed one or more subsequent images. In one embodiment, upon selecting the second reference image the planar target is refined to a more accurate planar target.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.