Systems and methods for a tunable electromagnetic field apparatus to improve doping uniformity
US10734231B2 · kind B2 · utility
0Cited by
2References
20Claims
0Family size
Assignee
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Key dates
| Filing date | Dec 28, 2018 |
| Grant date | Aug 4, 2020 |
| Priority date | — |
| Expiry date | Dec 28, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32715
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method includes receiving a semiconductor wafer into a chamber; generating a plasma within the chamber to accelerate particles toward the semiconductor wafer; generating a magnetic field above the semiconductor wafer by an electromagnetic structure contained within the chamber, wherein the electromagnetic structure comprises a plurality of electromagnetic elements; and adjusting the magnetic field, wherein the adjusting of the magnetic field includes moving positions of each of the plurality of electromagnetic elements independently.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.