Patent · US Active

Dual applicator fluid dispensing methods and systems

US10737286B2 · kind B2 · utility

0Cited by
24References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 2, 2018
Grant dateAug 11, 2020
Priority date
Expiry dateNov 8, 2038

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/67333
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Methods for simultaneously dispensing a first fluid pattern at a first dispense region with a first applicator and a second fluid pattern at a second dispense region with a second applicator. The first and second applicators are moved toward their respective dispense regions with a positioner. While dispensing, the second applicator is moved relative to the first applicator in a direction or directions parallel to a first axis, a second axis, and/or a third axis, the axes being mutually orthogonal. The first dispense region may be provided with a unique first tilt and/or a unique first contour relative to the reference plane and along the third axis. Systems for dispensing fluid include a primary positioner supporting a first applicator, and a secondary positioner coupled to the primary positioner and supporting a second applicator and configured to move the second applicator relative to the first applicator.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.