High-purity tantalum powder and preparation method thereof
US10737320B2 · kind B2 · utility
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8Claims
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Key dates
| Filing date | Feb 27, 2014 |
| Grant date | Aug 11, 2020 |
| Priority date | — |
| Expiry date | Nov 9, 2036 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB22F2998/10
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The present invention relates to a high-purity tantalum powder and a preparation method therefore. The tantalum powder has a purity of more than 99.995%, as analyzed by GDMS. Preferably, the tantalum powder has an oxygen content of not more than 1000 ppm, a nitrogen content of not more than 50 ppm, a hydrogen content of not more than 20 ppm, a magnesium content of not more than 5 ppm, and an average particle diameter D50 of less than 25 μm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.