Tools and methods for forming semi-transparent patterning masks
US10737433B2 · kind B2 · utility
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4Claims
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Key dates
| Filing date | Sep 18, 2014 |
| Grant date | Aug 11, 2020 |
| Priority date | — |
| Expiry date | Jul 17, 2036 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29K2995/0026
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
Means, apparatus, systems, and/or methods are described for forming improved rigid or flexible semi-transparent imprinting templates. These templates can be used to produce patterning masks having improved resolution that do not require plasma etching for residue removal. The methods and apparatus are compatible with roll-to-roll manufacturing processes and enable roll-to-roll formation of a wide range of metal patterned films.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.