Nanowire chain devices, systems, and methods of production
US10737938B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 20, 2017 |
| Grant date | Aug 11, 2020 |
| Priority date | — |
| Expiry date | Mar 21, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D62/121
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of depositing nanowire chains includes applying a nanowire mixture to a chain-site. The chain-site includes a patterned conductive film covering at least a portion of a surface of a substrate. The patterned conductive film includes a gap. The method also includes, after applying the nanowire mixture, forming a nanowire chain suspended adjacent to a portion of the patterned conductive film by generating an electric field proximate to the patterned conductive film; and depositing the nanowire chain across the gap by removing a liquid portion of the nanowire mixture. An average length of the nanowires of the nanowire mixture is less than a width of the gap.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.