Patent · US Active

Hard thin films

US10738375B2 · kind B2 · utility

0Cited by
9References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 15, 2016
Grant dateAug 11, 2020
Priority date
Expiry dateFeb 12, 2037

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC23C14/505
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Systems and methods provide for the improvement of surface properties via deposition of a film. A typical film may comprise at least three, including at least four components, and typically includes at least one of, including both of, Nitrogen and Oxygen. A film may include at least one of Silicon, Phosphorous, and Boron, and one or more modifiers. For some films, a modifier may include an element having a cationic field strength greater than 10 Å{circumflex over ( )}−2. A film may have a high hardness and/or modulus. A film, may be substantially transparent to visible light. Some films have high refractive indices. Some films have low refractive indices. Some films have very low ultraviolet extinction coefficients.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.