Method for preparing mask, mask and evaporation system
US10739672B2 · kind B2 · utility
1Cited by
0References
15Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Oct 31, 2017 |
| Grant date | Aug 11, 2020 |
| Priority date | — |
| Expiry date | Jun 23, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/166
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of preparing a mask, a mask and an evaporation system are provided. The mask includes a frame having an opening in a middle region thereof and a mask pattern disposed above the frame. The method of preparing the mask includes: applying first opposite forces to the frame during a molding process of the frame; applying second opposite forces to the frame, during a welding process when the mask pattern is welded to at least part of the frame to cover an inner opening region of the frame; wherein the first opposite forces and the second opposite forces are equal in magnitude and the same in direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.