Materials for masking substrates and associated methods
US10744529B2 · kind B2 · utility
0Cited by
55References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 1, 2015 |
| Grant date | Aug 18, 2020 |
| Priority date | — |
| Expiry date | Sep 1, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2201/09872
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A mask material is readily discernible from a substrate to which the mask material is applied. The mask material may have a discernible characteristic, such as its color, luminescence or the like, which may render it visibly distinct from the substrate or detectable using automated inspection equipment. The discernible characteristic of the mask material may render it detectable through a protective coating.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.