Molybdenum silylcyclopentadienyl and silylallyl complexes and use thereof in thin film deposition
US10745430B2 · kind B2 · utility
5Cited by
8References
21Claims
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Key dates
| Filing date | Mar 10, 2015 |
| Grant date | Aug 18, 2020 |
| Priority date | — |
| Expiry date | Mar 10, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10N70/011
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Molybdenum complexes and use thereof in thin film deposition, such as CVD and ALD are provided herein. The molybdenum complexes correspond in structure to Formula (I): wherein R1, R2, R3, R4, R5, R6, R7, R8, R9, and R10 are independently selected from the group consisting of hydrogen, alkyl, and trialkylsilyl; and at least one of R1, R2, R3, R4, R5, R6, R7, R8, R9, and R10 is trialkylsilyl.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.