Patent · US Active

Preparation of lacing resistant, titanium dioxide particles for use in photodurable thin film production

US10745529B2 · kind B2 · utility

1Cited by
10References
5Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 10, 2018
Grant dateAug 18, 2020
Priority date
Expiry dateAug 10, 2038

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08K2003/2241
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

A process is provided for the preparation of lacing resistant, titanium dioxide particles for use in photodurable thin film production. Said process involves dewatering titanium dioxide particles that have been encapsulated with a layer of amorphous alumina in continuous fashion at temperatures in excess of 100° C.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.